Filtration Solutions for Microelectronics

Reducing Airborne Molecular Contamination (AMC)

Fine particulate and Airborne Molecular Contamination (AMC) need to be carefully controlled for high-yield, low-reject semiconductor manufacturing. 

Sources of AMC include: 

  • chemical off-gassing
  • exhaust fumes from other industries and processes
  • vehicle exhaust fumes
  • seasonal factors

AAF offers a wide range of filtration solutions starting with pre-filters and fine filters through HEPA and ULPA filters to AMC filters. In addition, AAF offers a wide range of filter housings. In this way cleanroom classes with highest requirements can be achieved.

Failures due to AMC are classified as:

  • Mechanical effects, including obstruction of cooling airflow, interference of moving or optical parts and deformation of surfaces.
  • Chemical effects include corrosion of electrical components, due to dust comprised of sulphur and chlorine bearing salts.
  • Electrical effects include impedance changes and electronic circuit conductor bridging.

 

AAF International engineers are active in standardisation committees in both the United States and Europe. We play an important role in establishing new standards and recommending practices for cleanroom applications.

As an example, our engineers were key contributors in developing and writing the Institute of Environmental Sciences and Technology Recommended Practices. This professional competence is reflected in the design, manufacture, and testing of each cleanroom filtration solution we produce.

The result is cleanroom filters engineered and assembled to give you the particulate removal you require, while delivering energy efficiencies and savings to your bottom line.

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